In CMOS (Complementary Metal-Oxide-Semiconductor) fabrication, well formation is a critical step that enables the integration of both NMOS and PMOS transistors on the same silicon substrate. The two main types of well technologies used are the n-well and p-well processes. Understanding the differences between these two approaches is essential for electronics engineers, VLSI designers, and students preparing for competitive exams like GATE or IES. This article explores the key differences between … [Read more...]